Suedia, Echipamente industriale, Deep Reaction Ion Etcher (DRIE)

Uppsala universitet

Obiectul contractului

Suedia, Echipamente industriale, Deep Reaction Ion Etcher (DRIE)

Descriere

Myfab Uppsala aims at purchasing a Deep Reaction Ion Etcher (DRIE). The purpose of the tool is to transfer patterns defined by e.g., photo- and electron beam lithography covering the pattens size range from all substrate range down to a few nanometres. The system will be used by many operators in a university laboratory environment. It must be easy to use and be insensitive to frequent change of process between batches. The processes include broad range of etching capability: low to high etch rate, wafer dicing, high uniformity, high open area, high aspect ratio, and nanometre scale. The system is intended for etching of silicon as well as other materials compatible with silicon etching, with both photoresist resins and hard masks for patterning.

Tip anunț

Anunț de participare, Anunț de participare (UE)

Autoritate contractantă

Uppsala universitet

Cod CPV

42000000

Data publicării

12.10.2026

Termen de depunere

11.11.2026 00:59 (27 zile rămase)

Identificator

700865-2026

Anunțul oficial

Deschide în TED

Datele de mai sus sunt preluate automat. Sursa oficială rămâne singura cu valoare juridică.

Domeniu

Industria prelucrătoare